Papers > Science > EFFECT OF PULSED MAGNETRON SPUTTERING ON THE PROPERTIES OF ITO INDIUM TIN OXIDE THIN FILMS
|
Featured Papers from Direct Essays
|
|
|
|
|
|
This is a preview of a paper to view the full text you need to signup and login.
|
EFFECT OF PULSED MAGNETRON SPUTTERING ON THE PROPERTIES OF ITO INDIUM TIN OXIDE THIN FILMS
|
|
|
TCO (Transparent Conducting Oxide) thin films are widely used for electrodes in flat panel displays and touch panels. Recently there is a lot of interest in TCO films deposited on flexible plastic substrates due to the huge popularity of handheld devices. However it is extremely difficult to get satisfactory film properties when working with plastic substrates, because of the restriction on the substrate temperature during the deposition process. ... It was reported that the surface roughness of the ITO films used for electrodes in EL display plays an important roll in determining the efficiency of the display device [1, 2]. Also multilayered transparent conducting films, which consist of Ag thin films sandwiched between TCO films such as ITO, are being extensively used for transparent electrodes for flat panel displays and electro-magnetic interference shielding filters for PDPs(Plasma Display Panels). In these films, a smoother surface on the ITO films results in a lower surface resistivity of the multilayer film due to less electron scattering at the interface of the oxide-metal layers [3].
In this study we have deposited ITO (Indium Tin Oxide) films on glass at 70”ĘC and 120”ĘC substrate temperatures using a magnetron sputter at DC and unipolar pulse modes. We analyzed the electrical, structural, optical and morphological properties of the thin films using a 4-point probe, XRD, a UV/VIS spectrophotometer, and AFM, respectively. We show that it is possible to obtain excellent film properties, especially resistivity and surface morphology, at a relatively low substrate temperature using pulse magnetron sputtering. ... Experiment
ITO thin films were deposited on soda-lime glass substrates using a magnetron sputter source at DC and pulse modes in a single-ended-sputter system shown in Figure 1. ... 25”± size rectangular ITO target (In2O3 90wt% : SnO2 10wt%) of 99. ... 6 cm/second, the effective deposition time was 20 seconds, and the sputtering power was 2kW for all the samples. For the films deposited in the unipolar pulse mode, the frequency was kept constant at 50 kHz, with two different duty cycles as depicted in Figure 2.
|
|
|
To link to this page, copy the following code to your site:
|
|
Paper Information
|
|
|
Title: EFFECT OF PULSED MAGNETRON SPUTTERING ON THE PROPERTIES OF ITO INDIUM TIN OXIDE THIN FILMS
Words: 1671
Rating: None
Pages: 6.7
submitted by: nobuteru
If you think this paper shouldn't be here then
|
|
|
|
|
Signup & Login
|
|
|
If you don't currently have a login then Signup here
|
|
|
|
|
Pre-Written Papers
|
|
|
|
|
|
|
|
Custom Papers
|
|
|
|
|
|
|
|
